Patent · US Active

Gas nozzle substrate processing apparatus

USD783351S1 · kind S1 · design

455Cited by
9References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 9, 2015
Grant dateApr 11, 2017
Priority date
Expiry dateApr 11, 2032

Classification

  • Technology area (CPC —)General

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.