Selection of crystal orientation in diamond film chemical vapor
USH1792H · kind H · statutory invention registration
Assignee
Inventors
Key dates
| Filing date | — |
| Grant date | Apr 6, 1999 |
| Priority date | — |
| Expiry date | — |
Classification
- Technology area (CPC —)General
Abstract
In depositing an adhering, continuous, polycrystalline diamond film on a substrate by forming a refractory nitride interlayer on the substrate and depositing diamond on the interlayer in a vacuum chamber containing a microwave activated mixture of hydrogen and a gas including carbon, the crystal orientation of the deposited diamond, <111> or <100>, is selected by controlling the pressure in the chamber. Preferably, relatively higher microwave power is utilized at higher pressures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.