Pulsed plasma generation of extreme ultraviolet radiation
USH66H · kind H · statutory invention registration
2Cited by
0References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | — |
| Grant date | May 6, 1986 |
| Priority date | — |
| Expiry date | — |
Classification
- Technology area (CPC —)General
Abstract
The present invention relates to a system for generating extreme ultraviolet (XUV) radiation. The process utilizes pulsed plasmas to create a high density of ions in which non-linear frequency upconversion into the XUV region can occur. In particular, metals are utilized as the lasing medium in the present invention, since the ions of these metals do not absorb wavelengths in the XUV region and a significant level of XUV output may be obtained. Conventional UV lasers are utilized as the upconverters for the ionized metals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.