Manufacture of high precision electronic components with ultra-high purity liquids
USRE36290E · kind E · reissue
8Cited by
23References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 7, 1995 |
| Grant date | Sep 7, 1999 |
| Priority date | — |
| Expiry date | Sep 7, 2015 |
Classification
- Technology area (CPC —)General
Abstract
Semiconductor wafers and other electronic parts which similarly require ultra-high purity manufacturing environments are treated with ultra-high purity liquid cleaning and etching agents prepared at the site of use from gaseous raw materials which have been purified to a level compatible with semiconductor manufacturing standards, combined when appropriate with ultra-pure water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.