Manufacturing methods of liquid crystal displays
USRE38901E1 · kind E1 · reissue
Assignee
Inventors
Key dates
| Filing date | Feb 8, 2002 |
| Grant date | Nov 29, 2005 |
| Priority date | — |
| Expiry date | Feb 8, 2022 |
Classification
- Technology area (CPC —)General
Abstract
An ITO (indium tin oxide) layer and a negative photoresist are deposited sequentially on the substrate 100 having a gate wire, a storage wire, a data wire and a storage electrode. The negative photoresist is developed through front exposure and the ITO layer is etched to form a pixel electrode. Because the portions of negative photoresist exposed to light remain after development, pixel defects due to particles placed between pixel regions are reduced. Both the rear exposure and the front exposure may be used. In the rear exposure, it is difficult to remain the portions of the ITO layer at the positions corresponding to the contact portion of the drain electrode and the pixel electrode, the storage line, the gate pads and the data pads. Accordingly, the front exposure is then executed by using the first mask having openings thereon. The negative photoresist is developed, and the ITO layer is patterned. After etching the ITO layer, bemuse the portion of the ITO layer outside the display region remains as a whole, the portions of the ITO layers on the gate pads and the data pads remains through front exposure using a positive photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.