Litho strip and method for its manufacture
USRE40788E1 · kind E1 · reissue
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2004 |
| Grant date | Jun 23, 2009 |
| Priority date | — |
| Expiry date | Sep 10, 2024 |
Classification
- Technology area (CPC —)General
Abstract
A litho strip for use as an offset printing plate is described which has a composition of 0.05-0.25% Si, 0.30-0.40% Fe, 0.10-0.30% Mg, max. 0.05% Mn, and max. 0.04% Cu. The strip is produced from a continuous cast ingot of the above composition which is hot rolled to a thickness of up to 2-7 mm. The residual resistance ratio of the hot rolled strip is RR=10-20. The cold rolling is carried out with or without intermediate annealing, wherein the degree of rolling reduction after intermediate annealing is >60%. The further processing up to the EC roughening takes place with the microstructure adjusted in the rolling process at <100° C. The litho strip is characterized by a high thermal stability, a good roughening behavior in the EC processes, and a high reverse bending fatigue strength perpendicular to the rolling direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.