Patent · US Expired

Litho strip and method for its manufacture

USRE40788E1 · kind E1 · reissue

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9References
8Claims
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Assignee

Inventors

Key dates

Filing dateSep 10, 2004
Grant dateJun 23, 2009
Priority date
Expiry dateSep 10, 2024

Classification

  • Technology area (CPC —)General

Abstract

A litho strip for use as an offset printing plate is described which has a composition of 0.05-0.25% Si, 0.30-0.40% Fe, 0.10-0.30% Mg, max. 0.05% Mn, and max. 0.04% Cu. The strip is produced from a continuous cast ingot of the above composition which is hot rolled to a thickness of up to 2-7 mm. The residual resistance ratio of the hot rolled strip is RR=10-20. The cold rolling is carried out with or without intermediate annealing, wherein the degree of rolling reduction after intermediate annealing is >60%. The further processing up to the EC roughening takes place with the microstructure adjusted in the rolling process at <100° C. The litho strip is characterized by a high thermal stability, a good roughening behavior in the EC processes, and a high reverse bending fatigue strength perpendicular to the rolling direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.