Crestec Corporation
5Patents
3Active
5Granted
34Portfolio score
Filing activity: Jul 21, 2004 → Feb 19, 2009 · 3 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7522510B2 | Electron beam applying apparatus and drawing apparatus | Electricity | 1 | Expired |
| US8232711B2 | Surface emission type electron source and drawing device | Electricity | 0 | Active |
| US8158310B2 | Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure | Emerging Cross-Sectional Technologies | 0 | Active |
| US7929396B2 | Electron beam applying apparatus and drawing apparatus | Electricity | 0 | Active |
| US6989536B2 | Electron-beam writing device and electron-beam writing method | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.