Electron beam applying apparatus and drawing apparatus
US7522510B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 20, 2005 |
| Grant date | Apr 21, 2009 |
| Priority date | — |
| Expiry date | Sep 28, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An electron beam applying apparatus includes: a thermal field emission type electron source emitting an electron beam; an electrostatic lens disposed immediately below the electron source and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second angular aperture smaller than the first angular aperture; a condenser lens disposed on a downstream side of the electrostatic lens and condensing the electron beam condensed in the second aperture angel by the electrostatic lens in a crossover point; and an objective lens disposed on a downstream side of the condenser lens and condensing the electron beam condensed in the crossover point by the condenser lens on the surface of the material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.