LEEPL Corporation
6Patents
0Active
6Granted
24Portfolio score
Filing activity: Sep 27, 2000 → Jul 3, 2002
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6624430B2 | Method of measuring and calibrating inclination of electron beam in electron beam proximity exposure apparatus, and electron beam proximity exposure apparatus | Electricity | 6 | Expired |
| US6444374B1 | Manufacturing method of mask for electron beam proximity exposure and mask | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6894295B2 | Electron beam proximity exposure apparatus and mask unit therefor | Electricity | 3 | Expired |
| US6727507B2 | Electron beam proximity exposure apparatus and method | Electricity | 3 | Expired |
| US6717157B2 | Mask inspecting apparatus | Electricity | 2 | Expired |
| US6703623B1 | Electron beam proximity exposure apparatus | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.