Electron beam proximity exposure apparatus
US6703623B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2000 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | Dec 12, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The electronic beam proximity exposure apparatus comprises: an electron beam proximity exposure section which exposes a pattern corresponding to an aperture of a mask on a surface of an object with an electron beam having passed through the aperture of the mask, the mask being disposed in proximity to the surface of the object; a mask inspecting section which inspects the mask; and a mask carrying mechanism which carries the mask between the electron beam proximity exposure section and the mask inspecting section, and is characterized in that the electron beam proximity exposure section, the mask inspecting section and the mask carrying mechanism are communicated with one another through a common vacuum path so that the mask can be carried in a vacuum condition between the electron beam proximity exposure section and the mask inspecting section. This realizes the electronic beam proximity exposure apparatus that enhances a reliability by preventing a defect from being produced due to adhering dust or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.