Andrew P. Ryan
1Patents
1h-index
3Co-inventors
25Inventor score
Filing activity: Apr 13, 1990 → Apr 13, 1990
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5016332A | Plasma reactor and process with wafer temperature control | Physics | 64 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.