Inventor · Milpitas, CA, US

Barry Loevsky

12Patents
4h-index
16Co-inventors
49Inventor score

Filing activity: Jan 21, 2014 → Oct 28, 2019

Most-cited inventions

PatentTitleAreaCited byStatus
US9182219B1 Overlay measurement based on moire effect between structured illumination and overlay target Electricity 12 Active
US9123649B1 Fit-to-pitch overlay measurement targets Electricity 11 Active
US10190979B2 Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures Physics 8 Active
US10877437B2 Zero order blocking and diverging for holographic imaging Physics 6 Active
US10209183B2 Scatterometry system and method for generating non-overlapping and non-truncated diffraction images Physics 1 Active
US9719920B2 Scatterometry system and method for generating non-overlapping and non-truncated diffraction images Physics 1 Active
US9255787B1 Measurement of critical dimension and scanner aberration utilizing metrology targets Electricity 1 Active
US11663937B2 Pupil tracking in an image display system Physics 0 Active
US10458777B2 Polarization measurements of metrology targets and corresponding target designs Electricity 0 Active
US10352766B1 Focusing modules and methods Physics 0 Active
US9429856B1 Detectable overlay targets with strong definition of center locations Electricity 0 Active
US11060845B2 Polarization measurements of metrology targets and corresponding target designs Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.