Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures
US10190979B2 · kind B2 · utility
8Cited by
7References
21Claims
0Family size
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Key dates
| Filing date | Oct 30, 2015 |
| Grant date | Jan 29, 2019 |
| Priority date | — |
| Expiry date | Jun 6, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/392
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.