C.C. Wang
1Patents
1h-index
1Co-inventors
22Inventor score
Filing activity: Apr 2, 1981 → Apr 2, 1981
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4415402A | End-point detection in plasma etching or phosphosilicate glass | Physics | 41 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.