Chaitanya Ginde
3Patents
0h-index
6Co-inventors
24Inventor score
Filing activity: Jul 10, 2017 → Jul 1, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11840645B2 | CMP composition for polishing hard materials | Electricity | 0 | Active |
| US11078380B2 | Hard abrasive particle-free polishing of hard materials | Electricity | 0 | Active |
| US11820918B2 | Hard abrasive particle-free polishing of hard materials | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.