Charles J. Parrish
4Patents
2h-index
6Co-inventors
37Inventor score
Filing activity: Dec 13, 2001 → Dec 13, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6694498B2 | Feed-forward lithographic overlay offset method and system | Physics | 8 | Expired |
| US6674516B2 | Method of photolithographic exposure dose control as a function of resist sensitivity | Physics | 2 | Expired |
| US8193005B1 | MEMS process method for high aspect ratio structures | Electricity | 1 | Active |
| US6856378B2 | Method of photolithographic exposure dose control as a function of resist sensitivity | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.