Chris Cha
2Patents
2h-index
7Co-inventors
30Inventor score
Filing activity: Feb 24, 1998 → Aug 6, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5985759A | Oxygen enhancement of ion metal plasma (IMP) sputter deposited barrier layers | Electricity | 91 | Expired |
| US6271592A | Sputter deposited barrier layers | Electricity | 59 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.