David Knick
1Patents
0h-index
2Co-inventors
16Inventor score
Filing activity: Jan 26, 2016 → Jan 26, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10115572B2 | Methods for in-situ chamber clean in plasma etching processing chamber | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.