Deirdre Olynick
3Patents
1h-index
7Co-inventors
33Inventor score
Filing activity: Jun 2, 2006 → Mar 2, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8546264B2 | Etching radical controlled gas chopped deep reactive ion etching | Electricity | 4 | Active |
| US8479311B2 | Device and method for an atomic force microscope for the study and modification of surface properties | Physics | 0 | Active |
| US8512937B2 | Lithographic dry development using optical absorption | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.