Donggon WOO
1Patents
0h-index
3Co-inventors
19Inventor score
Filing activity: Jul 7, 2022 → Jul 7, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US12282249B2 | Full-chip cell critical dimension correction method and method of manufacturing mask using the same | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.