Inventor · Yokohama, JP

Eiji Sawa

17Patents
8h-index
33Co-inventors
72Inventor score

Filing activity: Apr 13, 1988 → Mar 23, 2015

Most-cited inventions

PatentTitleAreaCited byStatus
US5656344A Electroconductive polyurethane foam Emerging Cross-Sectional Technologies 22 Expired
US5565968A Developing roller, and method and apparatus for developing latent images using the roller Physics 19 Expired
US6435854B1 Apparatus for mixing and injection molding thermosetting polyurethane Performing Operations; Transporting 17 Expired
US5834116A Electroconductive roller Emerging Cross-Sectional Technologies 14 Expired
US6691439B1 Full-shrink labeled container and tubular shrink label Performing Operations; Transporting 13 Expired
US5082870A Method of making an electrically conductive polyurethane foam Chemistry; Metallurgy 9 Expired
US6888958B1 Method and apparatus for inspecting patterns Physics 8 Expired
US5878313A Developing roller and apparatus Performing Operations; Transporting 8 Expired
US7466854B2 Size checking method and apparatus Physics 6 Active
US6965687B2 Size checking method and apparatus Physics 5 Expired
US9036896B2 Inspection system and method for inspecting line width and/or positional errors of a pattern Physics 4 Active
US4842926A Laminated product Emerging Cross-Sectional Technologies 4 Expired
US7962077B2 Developing roller, developing apparatus comprising the developing roller, and method for providing the developing roller Emerging Cross-Sectional Technologies 2 Active
US8679370B2 Conductive coating, method for preparing a coating, roller, and method for manufacturing a roller and using a coating Emerging Cross-Sectional Technologies 2 Active
US8419977B2 Conductive coating, method for preparing a coating, roller, and method for manufacturing a roller and using a coating Emerging Cross-Sectional Technologies 1 Active
US9406117B2 Inspection system and method for inspecting line width and/or positional errors of a pattern Physics 1 Active
US9841385B2 Pattern characteristic-detection apparatus for photomask and pattern characteristic-detection method for photomask Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.