EITAN ROTHSTEIN
4Patents
1h-index
11Co-inventors
37Inventor score
Filing activity: Jun 14, 2019 → Sep 18, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11763181B2 | Metrology and process control for semiconductor manufacturing | Physics | 1 | Active |
| US11093840B2 | Metrology and process control for semiconductor manufacturing | Physics | 1 | Active |
| US12236364B2 | Metrology and process control for semiconductor manufacturing | Physics | 0 | Active |
| US12038271B2 | Detecting outliers and anomalies for OCD metrology machine learning | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.