Frank Bornebroek
3Patents
2h-index
13Co-inventors
41Inventor score
Filing activity: Mar 6, 1998 → May 29, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6297876A | Lithographic projection apparatus with an alignment system for aligning substrate on mask | Physics | 93 | Expired |
| US7112813B2 | Device inspection method and apparatus using an asymmetric marker | Physics | 43 | Expired |
| US8642235B2 | Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program product | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.