Frank Everts
9Patents
1h-index
13Co-inventors
40Inventor score
Filing activity: Apr 16, 2014 → Apr 26, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9645510B2 | Method of controlling a radiation source and lithographic apparatus comprising the radiation source | Electricity | 2 | Active |
| US10451890B2 | Reducing speckle in an excimer light source | Electricity | 1 | Active |
| US9762023B2 | Online calibration for repetition rate dependent performance variables | Electricity | 1 | Active |
| US11054665B2 | Reducing speckle in an excimer light source | Electricity | 1 | Active |
| US10627724B2 | Lithographic apparatus and method | Physics | 1 | Active |
| US11287743B2 | Control system and method | Electricity | 0 | Active |
| US11050213B2 | Online calibration for repetition rate dependent performance variables | Electricity | 0 | Active |
| US11686951B2 | Reducing speckle in an excimer light source | Electricity | 0 | Active |
| US10727642B2 | Online calibration for repetition rate dependent performance variables | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.