Fred Chen
6Patents
5h-index
8Co-inventors
48Inventor score
Filing activity: Jun 15, 1998 → Nov 7, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6210843A | Modulation of peripheral critical dimension on photomask with differential electron beam dose | Electricity | 10 | Expired |
| US6174798A | Process for forming metal interconnect stack for integrated circuit structure | Electricity | 8 | Expired |
| US6942958B2 | Modifying circuitry features in radiation sensitive layers with active secondary exposure masks | Physics | 6 | Expired |
| US7014956B2 | Active secondary exposure mask to manufacture integrated circuits | Physics | 5 | Expired |
| US6087726A | Metal interconnect stack for integrated circuit structure | Electricity | 5 | Expired |
| US6147409A | Modified multilayered metal line structure for use with tungsten-filled vias in integrated circuit structures | Electricity | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.