Inventor · Eltville am Rhein, DE

Fritz Erdmann

9Patents
4h-index
13Co-inventors
50Inventor score

Filing activity: Sep 18, 1978 → Mar 17, 1993

Most-cited inventions

PatentTitleAreaCited byStatus
US4555469A Process of preparing light-sensitive naphthoquinonediazidesulfonic acid ester Physics 55 Expired
US4424270A Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester Physics 36 Expired
US4266000A Photosensitive copying composition Physics 10 Expired
US5216158A Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation Physics 6 Expired
US4873169A Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same Physics 4 Expired
US4492748A Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith Physics 4 Expired
US5064959A Aromatic compounds substituted by 4,6-bis(trichloromethyl)-s-triazin-2-yl groups Chemistry; Metallurgy 3 Expired
US5563018A (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material Physics 1 Expired
US5358823A Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone Physics 1 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.