Hakseung Han
6Patents
1h-index
7Co-inventors
33Inventor score
Filing activity: Jun 25, 2020 → Mar 7, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11506968B2 | Method of annealing reflective photomask by using laser | Electricity | 2 | Active |
| US11562477B2 | Apparatus and method of measuring uniformity based on pupil image and method of manufacturing mask by using the method | Electricity | 1 | Active |
| US11852583B2 | Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the method | Physics | 0 | Active |
| US11635371B2 | Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the method | Physics | 0 | Active |
| US11934092B2 | Method of annealing reflective photomask by using laser | Electricity | 0 | Active |
| US12260539B2 | Apparatus and method of measuring uniformity based on pupil image and method of manufacturing mask by using the method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.