Apparatus and method of measuring uniformity based on pupil image and method of manufacturing mask by using the method
US12260539B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 4, 2023 |
| Grant date | Mar 25, 2025 |
| Priority date | — |
| Expiry date | Jun 3, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and output light, a stage configured to support a measurement target, an optical system configured to transfer the light, output from the light source, to the measurement target supported on the stage, and a first detector configured to detect light reflected and diffracted by the measurement target, or diffracted by passing through the measurement target, wherein the first detector is configured to detect a pupil image of a pupil plane and to measure pattern uniformity of an array area of the measurement target on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.