Herbert Vonach
10Patents
6h-index
9Co-inventors
55Inventor score
Filing activity: Mar 30, 1993 → Oct 20, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6768125B2 | Maskless particle-beam system for exposing a pattern on a substrate | Electricity | 89 | Expired |
| US6989546B2 | Particle multibeam lithography | Electricity | 20 | Expired |
| US5876880A | Process for producing a structured mask | Physics | 13 | Expired |
| US5742062A | Arrangement for masked beam lithography by means of electrically charged particles | Electricity | 11 | Expired |
| US5378917A | Particle-beam imaging system | Electricity | 8 | Expired |
| US5801388A | Particle beam, in particular ionic optic imaging system | Electricity | 8 | Expired |
| US5874739A | Arrangement for shadow-casting lithography | Electricity | 6 | Expired |
| US5436460A | Ion-optical imaging system | Electricity | 4 | Expired |
| US5693950A | Projection system for charged particles | Electricity | 2 | Expired |
| US8049189B2 | Charged particle system | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.