Hyeongeu Kim
6Patents
1h-index
7Co-inventors
36Inventor score
Filing activity: Jan 10, 2017 → Jun 15, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10643826B2 | Methods for thermally calibrating reaction chambers | Physics | 9 | Active |
| US10943771B2 | Methods for thermally calibrating reaction chambers | Physics | 1 | Active |
| US10732046B2 | System and method for thermally calibrating semiconductor process chambers | Electricity | 1 | Active |
| US11747209B2 | System and method for thermally calibrating semiconductor process chambers | Electricity | 0 | Active |
| US11390950B2 | Reactor system and method to reduce residue buildup during a film deposition process | Chemistry; Metallurgy | 0 | Active |
| US12043899B2 | Reactor system and method to reduce residue buildup during a film deposition process | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.