Irit Tzemah
3Patents
1h-index
11Co-inventors
34Inventor score
Filing activity: May 17, 2017 → Apr 3, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11175593B2 | Alignment sensor apparatus for process sensitivity compensation | Physics | 2 | Active |
| US10488767B2 | Alignment system wafer stack beam analyzer | Physics | 1 | Active |
| US10895813B2 | Lithographic cluster, lithographic apparatus, and device manufacturing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.