Lithographic cluster, lithographic apparatus, and device manufacturing method
US10895813B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2018 |
| Grant date | Jan 19, 2021 |
| Priority date | — |
| Expiry date | Oct 26, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.