Jerrell K. ANTOLIK
1Patents
1h-index
2Co-inventors
22Inventor score
Filing activity: Oct 15, 2015 → Oct 15, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USRE47275E1 | Substrate support providing gap height and planarization adjustment in plasma processing chamber | General | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.