John Haruff
2Patents
2h-index
4Co-inventors
41Inventor score
Filing activity: Jul 20, 1984 → Mar 9, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4557819A | System for igniting and controlling a wafer processing plasma | Electricity | 44 | Expired |
| US10591934B2 | Mass flow controller for substrate processing | Emerging Cross-Sectional Technologies | 5 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.