Inventor · New York, NY, US

Jonathan T. Shaw

16Patents
7h-index
5Co-inventors
51Inventor score

Filing activity: Nov 25, 2014 → Aug 3, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US9412667B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 17 Active
US9570354B2 Asymmetric high-K dielectric for reducing gate induced drain leakage Electricity 11 Active
US9577061B2 Asymmetric high-K dielectric for reducing gate induced drain leakage Electricity 10 Active
US9543213B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 9 Active
US9685379B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 8 Active
US9859122B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 7 Active
US9559010B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 7 Active
US9721843B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 6 Active
US9768071B2 Asymmetric high-K dielectric for reducing gate induced drain leakage Electricity 5 Active
US9922831B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 5 Active
US10367072B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 2 Active
US9837319B2 Asymmetric high-K dielectric for reducing gate induced drain leakage Electricity 2 Active
US10374048B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 1 Active
US11101357B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 0 Active
US10734492B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 0 Active
US10381452B2 Asymmetric high-k dielectric for reducing gate induced drain leakage Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.