Joshua Li
1Patents
1h-index
6Co-inventors
25Inventor score
Filing activity: Nov 25, 2003 → Nov 25, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7067419B2 | Mask layer and dual damascene interconnect structure in a semiconductor device | Electricity | 7 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.