Jyothi Singh
14Patents
10h-index
15Co-inventors
65Inventor score
Filing activity: Dec 9, 1987 → Dec 15, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5308414A | Method and apparatus for optical emission end point detection in plasma etching processes | Electricity | 58 | Expired |
| US5683538A | Control of etch selectivity | Electricity | 47 | Expired |
| US4846920A | Plasma amplified photoelectron process endpoint detection apparatus | Electricity | 41 | Expired |
| US5738440A | Combined emissivity and radiance measurement for the determination of the temperature of a radiant object | Physics | 31 | Expired |
| US5367139A | Methods and apparatus for contamination control in plasma processing | Emerging Cross-Sectional Technologies | 30 | Expired |
| US5993059A | Combined emissivity and radiance measurement for determination of temperature of radiant object | Physics | 30 | Expired |
| US5770097A | Control of etch selectivity | Electricity | 27 | Expired |
| US5387777A | Methods and apparatus for contamination control in plasma processing | Emerging Cross-Sectional Technologies | 26 | Expired |
| US5953115A | Method and apparatus for imaging surface topography of a wafer | Physics | 19 | Expired |
| US5382911A | Reaction chamber interelectrode gap monitoring by capacitance measurement | Electricity | 13 | Expired |
| US5534066A | Fluid delivery apparatus having an infrared feedline sensor | Chemistry; Metallurgy | 8 | Expired |
| US5492718A | Fluid delivery apparatus and method having an infrared feedline sensor | Chemistry; Metallurgy | 5 | Expired |
| US6048745A | Method for mapping scratches in an oxide film | Emerging Cross-Sectional Technologies | 2 | Expired |
| US6291833A | Apparatus for mapping scratches in an oxide film | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.