Linan Ji
9Patents
3h-index
17Co-inventors
46Inventor score
Filing activity: Oct 24, 2008 → Jan 29, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7749909B2 | Method of treating a semiconductor substrate | Emerging Cross-Sectional Technologies | 39 | Active |
| US7838425B2 | Method of treating surface of semiconductor substrate | Emerging Cross-Sectional Technologies | 18 | Active |
| US7985683B2 | Method of treating a semiconductor substrate | Emerging Cross-Sectional Technologies | 9 | Active |
| US9583330B2 | Supercritical drying method for semiconductor substrate and supercritical drying apparatus | Mechanical Engineering; Lighting; Heating | 2 | Active |
| US8567420B2 | Cleaning apparatus for semiconductor wafer | Electricity | 1 | Active |
| US9570286B2 | Supercritical drying method for semiconductor substrate | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US8771429B2 | Supercritical drying method for semiconductor substrate and supercritical drying apparatus | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US8950082B2 | Supercritical drying method for semiconductor substrate | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US8961696B2 | Method and device for cleaning semiconductor substrate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.