Luogi Chen
1Patents
1h-index
3Co-inventors
25Inventor score
Filing activity: Aug 14, 2007 → Aug 14, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7703069B1 | Three-dimensional mask model for photolithography simulation | Physics | 75 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.