Manuel SIX
1Patents
0h-index
9Co-inventors
19Inventor score
Filing activity: Dec 4, 2015 → Dec 4, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10227506B2 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.