Inventor · Orlando, FL, US

Margareth Seputro

3Patents
0h-index
5Co-inventors
24Inventor score

Filing activity: Sep 29, 2004 → Jan 3, 2008

Most-cited inventions

PatentTitleAreaCited byStatus
US7338569B2 Method and system of using offset gage for CMP polishing pad alignment and adjustment Performing Operations; Transporting 0 Expired
US7172496B1 Method and apparatus for cleaning slurry depositions from a water carrier Performing Operations; Transporting 0 Expired
US7527544B2 System of using offset gage for CMP polishing pad alignment and adjustment Performing Operations; Transporting 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.