Marilyn Kamna
2Patents
2h-index
3Co-inventors
30Inventor score
Filing activity: Oct 1, 1999 → Aug 15, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6485869B2 | Photomask frame modification to eliminate process induced critical dimension control variation | Physics | 19 | Expired |
| US6692878B2 | Photomask frame modification to eliminate process induced critical dimension control variation | Physics | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.