Mark Borowicz
4Patents
3h-index
12Co-inventors
40Inventor score
Filing activity: Mar 22, 2005 → Apr 28, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7304302B1 | Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis | Electricity | 41 | Active |
| US7488938B1 | Charge-control method and apparatus for electron beam imaging | Electricity | 6 | Active |
| US8765496B2 | Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis | Electricity | 3 | Active |
| US7365321B2 | Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis | Electricity | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.