Mark Lucas
6Patents
3h-index
7Co-inventors
50Inventor score
Filing activity: Feb 9, 1995 → Sep 28, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5677758A | Lithography System using dual substrate stages | Emerging Cross-Sectional Technologies | 99 | Expired |
| US6834264B2 | Method and apparatus for voice dictation and document production | Physics | 44 | Expired |
| US6483572B2 | Reticle alignment system for use in lithography | Physics | 4 | Expired |
| US6745461B2 | Automated grommet station | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7010842B2 | Method of setting grommets in a tarp | Emerging Cross-Sectional Technologies | 0 | Expired |
| US11743432B1 | Interaction management system for multiple kiosk devices and multiple virtual receptionist devices | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.