Markus Neuber
1Patents
1h-index
10Co-inventors
29Inventor score
Filing activity: Dec 20, 2017 → Dec 20, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10566426B2 | Forming silicon oxide layers by radical oxidation and semiconductor device with silicon oxide layer | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.