Markus Renno
2Patents
2h-index
9Co-inventors
27Inventor score
Filing activity: Sep 5, 2003 → Apr 16, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7029803B2 | Attenuating phase shift mask blank and photomask | Physics | 40 | Expired |
| US7517617B2 | Mask blank for use in EUV lithography and method for its production | Physics | 6 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.