Attenuating phase shift mask blank and photomask

US7029803B2 · kind B2 · utility

Assignees

• Schott AG · DE
• IBM Corporation · US

Inventors

• Hans Becker · Tönisvorst, DE
• Ute Buttgereit · Jena, DE
• Gunter Hess · Meiningen, DE
• Oliver Goetzberger · Meiningen, DE
• Frank Schmidt · Lisle, US
• Frank Sobel · Rixheim, FR
• Markus Renno · Meiningen, DE
• S. Jay Chey · Mount Kisco, US

Key dates

• Filing date: Sep 5, 2003
• Grant date: Apr 18, 2006
• Expiry date: Dec 8, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/32
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present invention relates to attenuating phase shift mask blanks for use in lithography, a method of fabricating such a mask blank.