Michel Cote
23Patents
10h-index
5Co-inventors
60Inventor score
Filing activity: Aug 17, 2001 → Oct 30, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6745372B2 | Method and apparatus for facilitating process-compliant layout optimization | Emerging Cross-Sectional Technologies | 220 | Expired |
| US7028285B2 | Standard cell design incorporating phase information | Physics | 215 | Expired |
| US6807663B2 | Accelerated layout processing using OPC pre-processing | Physics | 210 | Expired |
| US6978436B2 | Design data format and hierarchy management for phase processing | Physics | 201 | Expired |
| US7458045B2 | Silicon tolerance specification using shapes as design intent markers | Physics | 199 | Expired |
| US7312003B2 | Design and layout of phase shifting photolithographic masks | Physics | 112 | Expired |
| US6787271B2 | Design and layout of phase shifting photolithographic masks | Physics | 48 | Expired |
| US6721938B2 | Optical proximity correction for phase shifting photolithographic masks | Physics | 34 | Expired |
| US6681379B2 | Phase shifting design and layout for static random access memory | Physics | 16 | Expired |
| US7083879B2 | Phase conflict resolution for photolithographic masks | Physics | 12 | Expired |
| US7348108B2 | Design and layout of phase shifting photolithographic masks | Physics | 10 | Expired |
| US6852471B2 | Exposure control for phase shifting photolithographic masks | Physics | 8 | Expired |
| US6861204B2 | Design and layout of phase shifting photolithographic masks | Physics | 7 | Expired |
| US7500217B2 | Handling of flat data for phase processing including growing shapes within bins to identify clusters | Physics | 6 | Expired |
| US7435513B2 | Design and layout of phase shifting photolithographic masks | Physics | 6 | Expired |
| US6981240B2 | Cutting patterns for full phase shifting masks | Electricity | 4 | Expired |
| US7169515B2 | Phase conflict resolution for photolithographic masks | Physics | 2 | Expired |
| US8255840B2 | Silicon tolerance specification using shapes as design intent markers | Physics | 1 | Active |
| US7739649B2 | Design and layout of phase shifting photolithographic masks | Physics | 1 | Active |
| US7422841B2 | Exposure control for phase shifting photolithographic masks | Physics | 1 | Expired |
| US7629109B2 | Exposure control for phase shifting photolithographic masks | Physics | 0 | Active |
| US8977989B2 | Handling of flat data for phase processing including growing shapes within bins to identify clusters | Physics | 0 | Active |
| US8566757B2 | Layout of phase shifting photolithographic masks with refined shifter shapes | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.