Ming YAN
2Patents
1h-index
19Co-inventors
45Inventor score
Filing activity: Jan 29, 1999 → Oct 1, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6153849A | Method and apparatus for preventing etch rate drop after machine idle in plasma etch chamber | Electricity | 1 | Expired |
| US11616369B2 | Control method for a parallel MMC unit of a LCC-MMC hybrid cascade converter station | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.