Richard E. Wistron
1Patents
1h-index
3Co-inventors
25Inventor score
Filing activity: Feb 12, 2008 → Feb 12, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7826038B2 | Method for adjusting lithographic mask flatness using thermally induced pellicle stress | Physics | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.